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4Wave, Inc.

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PatentTitleStatus Expires Confidence
US 8,329,002Thin films and methods and machines for forming the thin films
Lapsed on the fee record
Ended Dec 11, 2024 · From the USPTO record
Lapsed on the fee recordEnded Dec 11, 2024From the USPTO record
US 6,819,871Multi-channel optical filter and multiplexer formed from stacks of thin-film layers
Term ended
Term ended Jun 27, 2022 · From the USPTO record
Term endedTerm ended Jun 27, 2022From the USPTO record
US 6,679,976System and method for performing sputter deposition with multiple targets using independent ion and electron sources and independent target biasing with DC pulse signals
Term ended
Ended no later than Mar 22, 2021 · From the USPTO record
Term endedEnded no later than Mar 22, 2021From the USPTO record
US 6,402,900System and method for performing sputter deposition using ion sources, targets and a substrate arranged about the faces of a cube
Term ended
Term ended Mar 16, 2021 · From the USPTO record
Term endedTerm ended Mar 16, 2021From the USPTO record
US 6,402,901System and method for performing sputter deposition using a spherical geometry
Term ended
Term ended Mar 16, 2021 · From the USPTO record
Term endedTerm ended Mar 16, 2021From the USPTO record
US 6,402,904System and method for performing sputter deposition using independent ion and electron sources and a target biased with an a-symmetric bi-polar DC pulse signal
Term ended
Term ended Mar 16, 2021 · From the USPTO record
Term endedTerm ended Mar 16, 2021From the USPTO record
US 6,402,905System and method for controlling deposition thickness using a mask with a shadow that varies along a radius of a substrate
Term ended
Term ended Mar 16, 2021 · From the USPTO record
Term endedTerm ended Mar 16, 2021From the USPTO record
US 6,419,802System and method for controlling deposition thickness by synchronously varying a sputtering rate of a target with respect to a position of a rotating substrate
Term ended
Term ended Mar 16, 2021 · From the USPTO record
Term endedTerm ended Mar 16, 2021From the USPTO record
US 6,488,821System and method for performing sputter deposition using a divergent ion beam source and a rotating substrate
Term ended
Term ended Mar 16, 2021 · From the USPTO record
Term endedTerm ended Mar 16, 2021From the USPTO record
US 6,723,209System and method for performing thin film deposition or chemical treatment using an energetic flux of neutral reactive molecular fragments, atoms or radicals
Term ended
Ended no later than Mar 16, 2021 · From the USPTO record
Term endedEnded no later than Mar 16, 2021From the USPTO record
10 of 14 patents shown.
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Pro members: see all 14 patents
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