Araca, Inc.
Records under this name other than the patents Araca, Inc. holds now: patents now held by others, patents whose terms have ended, and its applications, pending or abandoned. None of them is counted in the 4 patents it holds.
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 7,869,027 | Confocal Microscopy Pad Sample Holder That Measures Displacement and Method of Using the Same Lapsed on the fee record Ended Jan 11, 2015 · High confidence | Lapsed on the fee record | Ended Jan 11, 2015 | High confidence |
| 12/254,291 | Method and Apparatus for Determining Shear Force Between the Wafer Head and Polishing Pad in Chemical Mechanical Polishing held by Araca, Inc. and Fujikoshi Machinery Corp., Abandoned Abandoned Mar 26, 2012 | Abandoned | Abandoned Mar 26, 2012 | |
| 12/261,540 | Wafer Head Template for Chemical Mechanical Polishing and a Method for Its Use Abandoned Abandoned Mar 8, 2012 | Abandoned | Abandoned Mar 8, 2012 | |
| 12/262,974 | Device for Determining the Coefficient of Friction of Diamond Conditioner Discs and a Method of Use Thereof held by Mitsubishi Materials Corporation and Araca Inc. Abandoned Abandoned Oct 23, 2011 | Abandoned | Abandoned Oct 23, 2011 | |
| 12/341,604 | Method of Observing Pattern Evolution Using Variance and Fourier Transform Spectra of Friction Forces in CMP Abandoned Abandoned Oct 6, 2011 | Abandoned | Abandoned Oct 6, 2011 | |
| 12/359,772 | Method for Counting and Characterizing Aggressive Diamonds in CMP Diamond Conditioner Discs Abandoned Abandoned Oct 11, 2011 | Abandoned | Abandoned Oct 11, 2011 | |
| 12/392,676 | Method for CMP Uniformity Control Abandoned Abandoned Mar 25, 2012 | Abandoned | Abandoned Mar 25, 2012 | |
| 12/567,092 | Method of Chemical Mechanical Polishing held by Araca Inc., Tokyo Electron Inc. and Tohoku National University of Katahira Abandoned Abandoned Mar 1, 2013 | Abandoned | Abandoned Mar 1, 2013 | |
| 13/225,086 | Method and Apparatus for Chemical-Mechanical Planarization Abandoned Abandoned Jul 20, 2015 | Abandoned | Abandoned Jul 20, 2015 | |
| 18/276,355 | Chemical Mechanical Planarization Slurry Processing Techniques and Systems and Methods for Polishing Substrate Using the Same Pending Term is not computable until grant, so no date is shown and no estimate is implied. | Pending | Term is not computable until grant, so no date is shown and no estimate is implied. |