ASM Korea Ltd.

16 patents currently held · Updated Nov 15, 2026

4 more in force are now held by other companies

Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.

Previously recorded as ASM Genitech Korea Ltd. (to 2019)

Ending by 2030

Jul 2027

Next term end

When these terms end

5 yrs10 yrs20 yrs

Held patents by the year their term ends

20262027202820292030203120322033203420352036203720382039204020412042204320442045

Fee deadlines

Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.

1 fee due Dec 23, 2026
The maintenance fee for Lateral flow atomic layer deposition apparatus and atomic layer deposition method using the same (US 9,062,375) comes due Dec 23, 2026. Unpaid by Jun 23, 2027, it lapses early.
1 fee due Mar 29, 2027
The maintenance fee for Lateral flow atomic layer deposition device (US 9,145,609) comes due Mar 29, 2027. Unpaid by Sep 29, 2027, it lapses early.

Which patents, and when each one lapses · Pro

Recent changes

Nothing was recorded against this company's patents in the last 90 days.

Patents held now

Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.

Patent	Title	Status	Expires	Confidence
US 7,541,284	Method of depositing Ru films having high density In force Term ends Jul 24, 2027 · From the USPTO record	In force	Term ends Jul 24, 2027	From the USPTO record
US 8,215,264	Atomic layer deposition apparatus In force Term ends Sep 18, 2027 · From the USPTO record	In force	Term ends Sep 18, 2027	From the USPTO record
US 7,708,969	Method of Forming Metal Oxide In force Term ends Jan 27, 2028 · High confidence	In force	Term ends Jan 27, 2028	High confidence
US 8,545,940	Atomic layer deposition apparatus In force Term ends Nov 26, 2028 · From the USPTO record	In force	Term ends Nov 26, 2028	From the USPTO record
US 7,976,898	Atomic layer deposition apparatus In force Term ends Mar 10, 2029 · From the USPTO record	In force	Term ends Mar 10, 2029	From the USPTO record
US 8,092,606	Deposition apparatus In force Term ends Sep 12, 2029 · From the USPTO record	In force	Term ends Sep 12, 2029	From the USPTO record
US 8,076,242	Methods of forming an amorphous silicon thin film In force Term ends Jun 5, 2030 · From the USPTO record	In force	Term ends Jun 5, 2030	From the USPTO record
US 8,282,735	Atomic layer deposition apparatus In force Term ends Jan 4, 2031 · From the USPTO record	In force	Term ends Jan 4, 2031	From the USPTO record
US 8,273,408	Methods of depositing a ruthenium film In force Term ends Mar 12, 2031 · From the USPTO record	In force	Term ends Mar 12, 2031	From the USPTO record
US 8,347,813	Thin film deposition apparatus and method thereof In force Term ends Jun 30, 2031 · From the USPTO record	In force	Term ends Jun 30, 2031	From the USPTO record

10 of 16 patents shown.

Pro members see all 16.

Pro members: see all 16 patents

Also on record, not counted in the 16: 4 patents in force now held by others · 16 ended at full term · 1 surrendered on reissue. List them

Sources and methods

Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand. How this record was built

Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.

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Published applications

Every application published under this name has become a patent.