ASML US, Inc.
1 more in force is now held by another company
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.
Recorded under 2 name spellings.
Recorded as renamed to ASML Holding N.V. (2003)
0
Ending by 2030
Feb 2037
Next term end
When these terms end
Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045
Fee deadlines
Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
- 1 fee due Aug 25, 2027The maintenance fee for Hessian-free calculation of product of Hessian matrix and vector for lithography optimization (US 10,571,799) comes due Aug 25, 2027. Unpaid by Feb 25, 2028, it lapses early.
- 1 fee due Sep 3, 2027The maintenance fee for Mask pattern generation based on fast marching method (US 10,578,963) comes due Sep 3, 2027. Unpaid by Mar 3, 2028, it lapses early.
Recent changes
Nothing was recorded against this company's patents in the last 90 days.
Patents held now
Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.
Showing 1 to 7 of 7
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 10,146,124 | Full chip lithographic mask generation In force · From the USPTO record | In force | From the USPTO record | |
| US 10,209,615 | Simulating Near Field Image in Optical Lithography In force · High confidence | In force | High confidence | |
| US 11,119,401 | Simulating near field image in optical lithography In force · From the USPTO record | In force | From the USPTO record | |
| US 10,578,963 | Mask pattern generation based on fast marching method In force · From the USPTO record | In force | From the USPTO record | |
| US 10,705,420 | Mask bias approximation In force · From the USPTO record | In force | From the USPTO record | |
| US 10,571,799 | Hessian-free calculation of product of Hessian matrix and vector for lithography optimization In force · From the USPTO record | In force | From the USPTO record | |
| US 10,656,530 | Application of FreeForm MRC to SRAF optimization based on ILT mask optimization In force · From the USPTO record | In force | From the USPTO record |
Also on record, not counted in the 7: 1 patent in force now held by others · 93 lapsed for an unpaid fee · 167 ended at full term. List them
Sources and methods
Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand.
How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.
Published applications
US patent applications published under this name that have not become patents. An application is published about eighteen months after its earliest filing; one that has not been published is in no public record.
1 abandoned · 2 no status recorded