Coorstek GK
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.
Previously recorded as Coorstek KK (to 2024)
4
Ending by 2030
Jun 2029
Next term end
When these terms end
Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045
Fee deadlines
Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
- 1 fee due Dec 2, 2026The maintenance fee for Ceramics Composite (US 9,045,691) comes due Dec 2, 2026. Unpaid by Jun 2, 2027, it lapses early.
- 1 fee due Jan 21, 2027The maintenance fee for Method of Analyzing Nitride Semiconductor Layer and Method of Manufacturing Nitride Semiconductor Substrate Using the Analysis Method (US 9,086,321) comes due Jan 21, 2027. Unpaid by Jul 21, 2027, it lapses early.
- 2 fees due Feb 4 to 25, 2027 · next Feb 4
- 2 fees due Mar 19 to 22, 2027 · next Mar 19
- 2 fees due Aug 11 to 20, 2027 · next Aug 11
- 1 fee due Sep 17, 2027The maintenance fee for Nitride Semiconductor Substrate and Method for Manufacturing the Same (US 10,593,790) comes due Sep 17, 2027. Unpaid by Mar 17, 2028, it lapses early.
Recent changes
- 1 of the patents on this record was granted since Aug 16, 2026
- 1 term has ended since Aug 16, 2026
Patents held now
Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 9,096,826 | Culture Substrate and Culture Method for Undifferentiated Cell and Undifferentiated Cultured Cell In force · High confidence | In force | High confidence | |
| US 8,206,623 | Process for Producing Ceramic Fine Particles, and Ceramic Fine Particle Producing Apparatus Used Therein In force · High confidence | In force | High confidence | |
| US 9,428,728 | Carrier for Undifferentiated Cell Culture and Subculture Method Thereof In force · High confidence | In force | High confidence | |
| US 8,212,288 | Compound Semiconductor Substrate Comprising a Multilayer Buffer Layer In force · High confidence | In force | High confidence | |
| US 8,186,380 | Decompression Apparatus and Inorganic Porous Body In force · High confidence | In force | High confidence | |
| US 8,691,367 | Micro Channel Structure Body and Method of Manufacturing Micro Channel Structure Body In force · High confidence | In force | High confidence | |
| US 8,673,638 | Cell Culture Support and Cell Culture Method In force · High confidence | In force | High confidence | |
| US 8,637,960 | Nitride Semiconductor Substrate In force · High confidence | In force | High confidence | |
| US 8,785,942 | Nitride Semiconductor Substrate and Method of Manufacturing the Same In force · High confidence | In force | High confidence | |
| US 9,045,691 | Ceramics Composite In force · High confidence | In force | High confidence |
Also on record, not counted in the 45: 2 ended at full term. List them
Sources and methods
Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand.
How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.
Published applications
US patent applications published under this name that have not become patents. An application is published about eighteen months after its earliest filing; one that has not been published is in no public record.
1 pending