D2S, Inc.
Records under this name other than the patents D2S, Inc. holds now: patents now held by others, patents whose terms have ended, and its applications, pending or abandoned. None of them is counted in the 135 patents it holds.
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 7,772,575 | Stencil Design and Method for Cell Projection Particle Beam Lithography Formerly held In force · High confidence | In force | High confidence | |
| US 8,426,832 | Cell Projection Charged Particle Beam Lithography Formerly held In force · High confidence | In force | High confidence | |
| US 9,424,372 | System and method for data path handling, shot count minimization, and proximity effects correction related to mask writing process Formerly held In force · From the USPTO record | In force | From the USPTO record | |
| US 8,852,831 | Device for Manufacturing a Surface Using Character Projection Lithography with Variable Magnification Lapsed on the fee record Ended Oct 7, 2026 · High confidence | Lapsed on the fee record | Ended Oct 7, 2026 | High confidence |
| US 8,501,374 | Method for fracturing and forming a pattern using shaped beam charged particle beam lithography Lapsed on the fee record Ended Aug 6, 2025 · From the USPTO record | Lapsed on the fee record | Ended Aug 6, 2025 | From the USPTO record |
| US 8,431,914 | Method and system for manufacturing a surface using charged particle beam lithography with variable beam blur Lapsed on the fee record Ended Apr 30, 2025 · From the USPTO record | Lapsed on the fee record | Ended Apr 30, 2025 | From the USPTO record |
| US 8,404,404 | Method and System for Manufacturing a Surface Using Character Projection Lithography with Variable Magnification Lapsed on the fee record Ended Mar 26, 2025 · High confidence | Lapsed on the fee record | Ended Mar 26, 2025 | High confidence |
| US 8,343,695 | Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography Lapsed on the fee record Ended Jan 1, 2025 · From the USPTO record | Lapsed on the fee record | Ended Jan 1, 2025 | From the USPTO record |
| US 8,017,286 | Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography Lapsed on the fee record Ended Sep 13, 2023 · From the USPTO record | Lapsed on the fee record | Ended Sep 13, 2023 | From the USPTO record |
| US 7,914,954 | Stencil, stencil design system and method for cell projection particle beam lithography Lapsed on the fee record Ended Mar 29, 2023 · From the USPTO record | Lapsed on the fee record | Ended Mar 29, 2023 | From the USPTO record |