DNF Co., Ltd.
1 more in force is now held by another company
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.
1
Ending by 2030
Jan 2030
Next term end
When these terms end
Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045
Fee deadlines
Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
- 1 fee due Jan 23, 2027The maintenance fee for Organometallic Precursors, Methods of Forming a Layer Using the Same and Methods of Manufacturing Semiconductor Devices Using the Same (US 10,361,118) comes due Jan 23, 2027. Unpaid by Jul 23, 2027, it lapses early.
- 1 fee due Mar 5, 2027The maintenance fee for Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin using the same (US 11,749,522) comes due Mar 5, 2027. Unpaid by Sep 7, 2027, it lapses early.
- 1 fee due May 28, 2027The maintenance fee for Method of Manufacturing Ruthenium-Containing Thin Film and Ruthenium-Containing Thin Film Manufactured Therefrom (US 11,827,650) comes due May 28, 2027. Unpaid by Nov 29, 2027, it lapses early.
- 1 fee due Jul 26, 2027The maintenance fee for Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same (US 9,245,740) comes due Jul 26, 2027. Unpaid by Jan 26, 2028, it lapses early.
- 1 fee due Aug 13, 2027The maintenance fee for Atomic Layer Etching Method and Semiconductor Device Manufacturing Method Using the Same (US 11,901,191) comes due Aug 13, 2027. Unpaid by Feb 14, 2028, it lapses early.
Recent changes
- 1 of the patents on this record was granted since Aug 16, 2026
Patents held now
Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 8,525,244 | Germanium Compound, Semiconductor Device Fabricated Using the Same, and Methods of Forming the Same In force · High confidence | In force | High confidence | |
| US 9,245,740 | Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same In force · From the USPTO record | In force | From the USPTO record | |
| US 9,586,979 | Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same In force · From the USPTO record | In force | From the USPTO record | |
| US 9,809,608 | Cyclodisilazane derivative, method for preparing the same and silicon-containing thin film using the same In force · From the USPTO record | In force | From the USPTO record | |
| US 10,202,407 | Trisilyl amine derivative, method for preparing the same and silicon-containing thin film using the same In force · From the USPTO record | In force | From the USPTO record | |
| US 9,916,974 | Amino-silyl amine compound and the manufacturing method of dielectric film containing Si—N bond by using atomic layer deposition In force · From the USPTO record | In force | From the USPTO record | |
| US 10,214,610 | Polymer and Composition Containing Same In force · High confidence | In force | High confidence | |
| US 10,134,583 | Methods of Forming a Low-K Dielectric Layer and Methods of Fabricating a Semiconductor Device Using the Same In force · High confidence | In force | High confidence | |
| US 10,224,200 | Aluminum Compound, Method of Forming Thin Film by Using the Same, and Method of Fabricating Integrated Circuit Device In force · High confidence | In force | High confidence | |
| US 10,913,755 | Transition metal compound, preparation method therefor, and composition for depositing transition metal-containing thin film, containing same In force · From the USPTO record | In force | From the USPTO record |
Also on record, not counted in the 32: 1 patent in force now held by others. List them
Sources and methods
Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand.
How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.
Published applications
US patent applications published under this name that have not become patents. An application is published about eighteen months after its earliest filing; one that has not been published is in no public record.
10 pending · 3 abandoned · 3 no status recorded