Enpulse Co., Ltd.

47 patents currently held · Updated Nov 14, 2026

Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.

Ending by 2030

May 2038

Next term end

When these terms end

5 yrs10 yrs20 yrs

Held patents by the year their term ends

20262027202820292030203120322033203420352036203720382039204020412042204320442045

Fee deadlines

Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.

1 fee due Feb 15, 2027
The maintenance fee for Porous Polyurethane Polishing Pad and Preparation Method Thereof (US 11,724,356) comes due Feb 15, 2027. Unpaid by Aug 16, 2027, it lapses early.
2 fees due Mar 19 to 26, 2027 · next Mar 19
2 fees due Apr 3 to 10, 2027 · next Apr 3
2 fees due Jun 24 to 30, 2027 · next Jun 24
1 fee due Sep 19, 2027
The maintenance fee for Polishing Pad, Process for Preparing the Same, and Process for Preparing a Semiconductor Device Using the Same (US 11,931,856) comes due Sep 19, 2027. Unpaid by Mar 20, 2028, it lapses early.
2 fees due Oct 9 to 23, 2027 · next Oct 9

Which patents, and when each one lapses · Pro

Recent changes

4 of the patents on this record were granted since Aug 16, 2026

Patents held now

Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.

Patent	Title	Status	Expires	Confidence
US 10,513,007	Porous Polyurethane Polishing Pad and Process for Preparing a Semiconductor Device by Using the Same In force Term ends May 25, 2038 · High confidence	In force	Term ends May 25, 2038	High confidence
US 10,518,383	Porous Polyurethane Polishing Pad and Process for Preparing a Semiconductor Device by Using the Same In force Term ends May 25, 2038 · High confidence	In force	Term ends May 25, 2038	High confidence
US 11,325,222	Porous Polyurethane Polishing Pad and Method for Manufacturing Same In force Term ends Sep 29, 2038 · High confidence	In force	Term ends Sep 29, 2038	High confidence
US 11,642,752	Porous Polyurethane Polishing Pad and Process for Preparing the Same In force Term ends Jul 24, 2039 · High confidence	In force	Term ends Jul 24, 2039	High confidence
US 11,571,783	Polishing Pad Having Excellent Airtightness In force Term ends Nov 6, 2039 · High confidence	In force	Term ends Nov 6, 2039	High confidence
US 11,000,935	Polishing Pad That Minimizes Occurrence of Defects and Process for Preparing the Same In force Term ends Feb 13, 2040 · High confidence	In force	Term ends Feb 13, 2040	High confidence
US 11,279,825	Composition for Polishing Pad, Polishing Pad and Preparation Method Thereof In force Term ends Jun 7, 2040 · High confidence	In force	Term ends Jun 7, 2040	High confidence
US 11,548,970	Composition for a Polishing Pad, Polishing Pad, and Process for Preparing the Same In force Term ends Jun 7, 2040 · High confidence	In force	Term ends Jun 7, 2040	High confidence
US 11,207,757	Composition for Polishing Pad, Polishing Pad and Preparation Method of Semiconductor Device In force Term ends Jun 12, 2040 · High confidence	In force	Term ends Jun 12, 2040	High confidence
US 11,267,098	Leakage-Proof Polishing Pad and Process for Preparing the Same In force Term ends Jul 7, 2040 · High confidence	In force	Term ends Jul 7, 2040	High confidence

10 of 47 patents shown.

Pro members see all 47.

Pro members: see all 47 patents

Sources and methods

Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand. How this record was built

Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.

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