ESOL, Inc.
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.
0
Ending by 2030
Nov 2041
Next term end
When these terms end
Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045
Fee deadlines
Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
- 2 fees due May 14 to 28, 2027 · next May 14
- 1 fee due Aug 13, 2027The maintenance fee for EUV mask inspection device using multilayer reflection zone plate (US 11,898,970) comes due Aug 13, 2027. Unpaid by Feb 14, 2028, it lapses early.
Recent changes
- 1 of the patents on this record was granted since Aug 16, 2026
Patents held now
Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 11,619,876 | System of Inspecting Pattern Defect in Scanning-Type Reflective Extreme Ultraviolet Mask In force · High confidence | In force | High confidence | |
| US 11,561,467 | Reflectivity and transmittance measuring device of EUV mask and EUV pellicle In force · From the USPTO record | In force | From the USPTO record | |
| US 11,829,064 | EUV lighting device using multilayer reflection zone plate and manufacturing method thereof In force · From the USPTO record | In force | From the USPTO record | |
| US 11,740,552 | Pellicle Structure for Euv Lithography and Manufacturing Method Therefor In force · High confidence | In force | High confidence | |
| US 11,817,230 | Device for EUV light source In force · From the USPTO record | In force | From the USPTO record | |
| US 11,898,970 | EUV mask inspection device using multilayer reflection zone plate In force · From the USPTO record | In force | From the USPTO record | |
| US 12,287,579 | High-performance EUV microscope device with free-form illumination system structure having elliptical mirror In force · From the USPTO record | In force | From the USPTO record | |
| US 12,282,144 | High-performance EUV microscope device with free-form illumination system structure In force · From the USPTO record | In force | From the USPTO record | |
| US 12,250,763 | EUV light source device and plasma gas recycling system for high-density plasma generation In force · From the USPTO record | In force | From the USPTO record | |
| US 12,332,188 | High-performance EUV microscope with free form illumination system In force · From the USPTO record | In force | From the USPTO record |
Also on record, not counted in the 11: 1 lapsed for an unpaid fee. List them
Sources and methods
Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand.
How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.
Published applications
US patent applications published under this name that have not become patents. An application is published about eighteen months after its earliest filing; one that has not been published is in no public record.
3 pending