Fine Semitech Corp.
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.
0
Ending by 2030
Feb 2031
Next term end
When these terms end
Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045
Fee deadlines
Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
- 1 fee due Feb 27, 2027The maintenance fee for Pellicle Film Including Graphite-Containing Thin Film for Extreme Ultraviolet Lithography (US 10,394,117) comes due Feb 27, 2027. Unpaid by Aug 27, 2027, it lapses early.
- 1 fee due Apr 17, 2027The maintenance fee for Method for applying multi-component curable composition (US 11,790,552) comes due Apr 17, 2027. Unpaid by Oct 18, 2027, it lapses early.
Recent changes
Nothing was recorded against this company's patents in the last 90 days.
Patents held now
Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.
Showing 1 to 9 of 9
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 8,404,405 | Pellicle Frame, Pellicle, Lithography Apparatus, and Method of Fabricating the Pellicle Frame In force · High confidence | In force | High confidence | |
| US 9,436,077 | Method of Fabricating a Pellicle Frame In force · High confidence | In force | High confidence | |
| US 8,779,403 | Apparatus and Method for Generating Extreme Ultra Violet Radiation In force · High confidence | In force | High confidence | |
| US 10,001,700 | Pellicle Film Including Graphite-Containing Thin Film for Extreme Ultraviolet Lithography In force · High confidence | In force | High confidence | |
| US 10,394,117 | Pellicle Film Including Graphite-Containing Thin Film for Extreme Ultraviolet Lithography In force · High confidence | In force | High confidence | |
| US 10,087,348 | Pellicle Including a Water-Soluble Adhesive and Photomask Assembly Including the Pellicle In force · High confidence | In force | High confidence | |
| US 12,281,243 | Method of Removing an Adhesive for an Euv Mask and Method of Reusing an Euv Mask In force · High confidence | In force | High confidence | |
| US 11,790,552 | Method for applying multi-component curable composition In force · From the USPTO record | In force | From the USPTO record | |
| US 12,641,715 | Large Area Monitoring Apparatus In force · High confidence | In force | High confidence |
Sources and methods
Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand.
How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.
Published applications
US patent applications published under this name that have not become patents. An application is published about eighteen months after its earliest filing; one that has not been published is in no public record.
1 pending · 1 abandoned