The Patent Finder

Fine Semitech Corp.

9 patents currently held · Updated Nov 15, 2026
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.
0
Ending by 2030
Feb 2031
Next term end

When these terms end

Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045

Fee deadlines

Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
  • 1 fee due Feb 27, 2027
    The maintenance fee for Pellicle Film Including Graphite-Containing Thin Film for Extreme Ultraviolet Lithography (US 10,394,117) comes due Feb 27, 2027. Unpaid by Aug 27, 2027, it lapses early.
  • 1 fee due Apr 17, 2027
    The maintenance fee for Method for applying multi-component curable composition (US 11,790,552) comes due Apr 17, 2027. Unpaid by Oct 18, 2027, it lapses early.

Which patents, and when each one lapses · Pro

Recent changes

Nothing was recorded against this company's patents in the last 90 days.

Patents held now

Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.

Showing 1 to 9 of 9

PatentTitleStatus Expires Confidence
US 8,404,405Pellicle Frame, Pellicle, Lithography Apparatus, and Method of Fabricating the Pellicle Frame
In force
 · High confidence
In forceHigh confidence
US 9,436,077Method of Fabricating a Pellicle Frame
In force
 · High confidence
In forceHigh confidence
US 8,779,403Apparatus and Method for Generating Extreme Ultra Violet Radiation
In force
 · High confidence
In forceHigh confidence
US 10,001,700Pellicle Film Including Graphite-Containing Thin Film for Extreme Ultraviolet Lithography
In force
 · High confidence
In forceHigh confidence
US 10,394,117Pellicle Film Including Graphite-Containing Thin Film for Extreme Ultraviolet Lithography
In force
 · High confidence
In forceHigh confidence
US 10,087,348Pellicle Including a Water-Soluble Adhesive and Photomask Assembly Including the Pellicle
In force
 · High confidence
In forceHigh confidence
US 12,281,243Method of Removing an Adhesive for an Euv Mask and Method of Reusing an Euv Mask
In force
 · High confidence
In forceHigh confidence
US 11,790,552Method for applying multi-component curable composition
In force
 · From the USPTO record
In forceFrom the USPTO record
US 12,641,715Large Area Monitoring Apparatus
In force
 · High confidence
In forceHigh confidence

Sources and methods

Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand. How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.

Published applications

US patent applications published under this name that have not become patents. An application is published about eighteen months after its earliest filing; one that has not been published is in no public record.

1 pending · 1 abandoned

List them

The Patent Finder CompaniesExpirationsCalculatorWatchlistPricing MethodologyCorrectionsLegalPrivacysupport@thepatentfinder.com Updated Nov 15, 2026 · includes USPTO assignment & status data published Nov 15, 2026 and grant & fee data published Nov 10, 2026 (weekly) Part of 137 Finder · © 2026 137 Finder LLC · Sources cited