Highlight Tech Corp.
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.
Recorded under 2 name spellings.
0
Ending by 2030
Apr 2042
Next term end
When these terms end
Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045
Fee deadlines
Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
- 1 fee due Apr 30, 2027The maintenance fee for Long-effect self-cleaning negative-pressure ejector (US 11,801,473) comes due Apr 30, 2027. Unpaid by Nov 1, 2027, it lapses early.
- 1 fee due Jun 5, 2027The maintenance fee for Electrical discharge machining apparatus and electrical discharge machining method with adjustable machining parameters (US 11,833,603) comes due Jun 5, 2027. Unpaid by Dec 6, 2027, it lapses early.
- 1 fee due Jul 30, 2027The maintenance fee for Annealing system and annealing method integrated with laser and microwave (US 11,889,609) comes due Jul 30, 2027. Unpaid by Jan 31, 2028, it lapses early.
Recent changes
Nothing was recorded against this company's patents in the last 90 days.
Patents held now
Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 11,801,473 | Long-effect self-cleaning negative-pressure ejector In force · From the USPTO record | In force | From the USPTO record | |
| US 12,262,460 | Fast annealing equipment In force · From the USPTO record | In force | From the USPTO record | |
| US 11,833,603 | Electrical discharge machining apparatus and electrical discharge machining method with adjustable machining parameters In force · From the USPTO record | In force | From the USPTO record | |
| US 11,889,609 | Annealing system and annealing method integrated with laser and microwave In force · From the USPTO record | In force | From the USPTO record | |
| US 12,002,677 | Processing Device and Processing Method for Solid Structure In force · High confidence | In force | High confidence | |
| US 12,151,257 | Self-cleaning negative-pressure ejector In force · From the USPTO record | In force | From the USPTO record | |
| US 12,280,326 | System for separation of gas and solid In force · From the USPTO record | In force | From the USPTO record | |
| US 12,112,958 | Wafer Processing System In force · High confidence | In force | High confidence | |
| US 12,472,570 | Electrical discharge machining apparatus In force · From the USPTO record | In force | From the USPTO record | |
| US 12,685,957 | Semiconductor Waste Gas Treatment System and Moisture-Gas Separator of the Same In force · High confidence | In force | High confidence |
Also on record, not counted in the 11: 5 lapsed for an unpaid fee. List them
Sources and methods
Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand.
How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.
Published applications
US patent applications published under this name that have not become patents. An application is published about eighteen months after its earliest filing; one that has not been published is in no public record.
3 pending · 1 abandoned · 3 no status recorded