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Integrated Process Equipment Corp.

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Records under this name other than patents Integrated Process Equipment Corp. holds now: patents now held by others, patents whose terms have ended, and its applications, pending or abandoned.

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PatentTitleStatus Expires Confidence
US 6,280,291Wafer sensor utilizing hydrodynamic pressure differential
Formerly held
Term ended
Term ended Feb 16, 2019 · From the USPTO record
Term endedTerm ended Feb 16, 2019From the USPTO record
US 6,261,158Multi-step chemical mechanical polishing
Formerly held
Term ended
Term ended Dec 16, 2018 · From the USPTO record
Term endedTerm ended Dec 16, 2018From the USPTO record
US 6,184,139Oscillating orbital polisher and method
Formerly held
Term ended
Term ended Sep 17, 2018 · From the USPTO record
Term endedTerm ended Sep 17, 2018From the USPTO record
US 6,500,055Oscillating orbital polisher and method
Formerly held
Term ended
Term ended Sep 17, 2018 · From the USPTO record
Term endedTerm ended Sep 17, 2018From the USPTO record
US 6,121,152Method and apparatus for planarization of metallized semiconductor wafers using a bipolar electrode assembly
Formerly held
Term ended
Term ended Jun 11, 2018 · From the USPTO record
Term endedTerm ended Jun 11, 2018From the USPTO record
US 6,132,586Method and apparatus for non-contact metal plating of semiconductor wafers using a bipolar electrode assembly
Formerly held
Term ended
Term ended Jun 11, 2018 · From the USPTO record
Term endedTerm ended Jun 11, 2018From the USPTO record
US 6,143,155Method for simultaneous non-contact electrochemical plating and planarizing of semiconductor wafers using a bipiolar electrode assembly
Formerly held
Term ended
Term ended Jun 11, 2018 · From the USPTO record
Term endedTerm ended Jun 11, 2018From the USPTO record
US 6,106,662Method and apparatus for endpoint detection for chemical mechanical polishing
Formerly held
Term ended
Term ended Jun 8, 2018 · From the USPTO record
Term endedTerm ended Jun 8, 2018From the USPTO record
US 6,361,646Method and apparatus for endpoint detection for chemical mechanical polishing
Formerly held
Term ended
Ended no later than Jun 8, 2018 · From the USPTO record
Term endedEnded no later than Jun 8, 2018From the USPTO record
US 4,828,660Method and apparatus for the continuous on-site chemical reprocessing of ultrapure liquids
Formerly held
Term ended
Term ended no later than May 9, 2009 · Low confidence
Term endedTerm ended no later than May 9, 2009Low confidence
10 of 69 patents shown.
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Pro members: see all 69 patents
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