IonQuest Corp.
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.
0
Ending by 2030
Sep 2036
Next term end
When these terms end
Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045
Fee deadlines
Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
- 3 fees due May 19 to 21, 2027 · next May 19
Recent changes
Nothing was recorded against this company's patents in the last 90 days.
Patents held now
Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 10,227,692 | Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition Plasma Source for Depositing Diamond and Diamond-Like Films In force · Low confidence | In force | Low confidence | |
| US 10,913,998 | Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films In force · From the USPTO record | In force | From the USPTO record | |
| US 11,286,555 | Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films In force · From the USPTO record | In force | From the USPTO record | |
| US 11,821,068 | Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films In force · From the USPTO record | In force | From the USPTO record | |
| US 12,077,849 | Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source In force · From the USPTO record | In force | From the USPTO record | |
| US 10,900,118 | Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like films In force · From the USPTO record | In force | From the USPTO record | |
| US 11,823,859 | Sputtering a layer on a substrate using a high-energy density plasma magnetron In force · From the USPTO record | In force | From the USPTO record | |
| US 10,957,519 | Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films In force · From the USPTO record | In force | From the USPTO record | |
| US 10,227,691 | Magnetically Enhanced Low Temperature-High Density Plasma-Chemical Vapor Deposition Plasma Source for Depositing Diamond and Diamond Like Films In force · Medium confidence | In force | Medium confidence | |
| US 10,480,063 | Capacitive coupled plasma source for sputtering and resputtering In force · From the USPTO record | In force | From the USPTO record |
Also on record, not counted in the 14: 2 lapsed for an unpaid fee. List them
Sources and methods
Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand.
How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.
Published applications
US patent applications published under this name that have not become patents. An application is published about eighteen months after its earliest filing; one that has not been published is in no public record.
4 no status recorded