IV Technologies Co., Ltd.
1 more in force is now held by another company
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.
6
Ending by 2030
May 2027
Next term end
When these terms end
Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045
Fee deadlines
Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
- 1 fee due Mar 24, 2027The maintenance fee for Base Layer, Polishing Pad with Base Layer, and Polishing Method (US 10,421,173) comes due Mar 24, 2027. Unpaid by Sep 24, 2027, it lapses early.
- 1 fee due May 19, 2027The maintenance fee for Manufacturing Method of Polishing Layer, and Polishing Method (US 10,478,940) comes due May 19, 2027. Unpaid by Nov 19, 2027, it lapses early.
- 2 fees due Jun 26 to 30, 2027 · next Jun 26
- 2 fees due Jul 2 to 16, 2027 · next Jul 2
Recent changes
- 1 term has ended since Aug 16, 2026
Patents held now
Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 8,480,773 | Method of fabricating a polishing pad In force · From the USPTO record | In force | From the USPTO record | |
| US 8,393,936 | Substrate retaining ring for CMP In force · From the USPTO record | In force | From the USPTO record | |
| US RE46,648 | Polishing pad, polishing method and method of forming polishing pad In force · From the USPTO record | In force | From the USPTO record | |
| US 8,016,647 | Polishing pad and method thereof In force · From the USPTO record | In force | From the USPTO record | |
| US 8,303,382 | Polishing pad and method of fabrication In force · From the USPTO record | In force | From the USPTO record | |
| US 8,118,645 | Polishing method, polishing pad, and polishing system In force · From the USPTO record | In force | From the USPTO record | |
| US 8,398,461 | Polishing method, polishing pad and polishing system In force · From the USPTO record | In force | From the USPTO record | |
| US 8,303,378 | Polishing pad, polishing method and method of forming polishing pad In force · From the USPTO record | In force | From the USPTO record | |
| US 9,707,662 | Method of manufacturing polishing pad having detection window and polishing pad having detection window In force · From the USPTO record | In force | From the USPTO record | |
| US 8,609,001 | Method of manufacturing polishing pad having detection window In force · From the USPTO record | In force | From the USPTO record |
Also on record, not counted in the 28: 1 patent in force now held by others · 10 ended at full term · 1 surrendered on reissue. List them
Sources and methods
Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand.
How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.
Published applications
US patent applications published under this name that have not become patents. An application is published about eighteen months after its earliest filing; one that has not been published is in no public record.
1 pending · 5 no status recorded