The Patent Finder

Liteq B.V.

8 patents currently held · Updated Nov 14, 2026
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.

Previously recorded as Kulicke & Soffa Liteq B.V. (to 2025)

0
Ending by 2030
Apr 2035
Next term end

When these terms end

Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045

Fee deadlines

Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
  • 1 fee due Jun 24, 2027
    The maintenance fee for Lithographic Apparatus and Method for Preventing Peripheral Exposure of a Substrate (US 10,514,609) comes due Jun 24, 2027. Unpaid by Dec 27, 2027, it lapses early.
  • 1 fee due Sep 5, 2027
    The maintenance fee for Lithographic Systems and Methods of Operating the Same (US 11,921,435) comes due Sep 5, 2027. Unpaid by Mar 6, 2028, it lapses early.
  • 1 fee due Oct 2, 2027
    The maintenance fee for Lithographic Systems and Methods of Operating the Same (US 11,947,271) comes due Oct 2, 2027. Unpaid by Apr 3, 2028, it lapses early.

Which patents, and when each one lapses · Pro

Recent changes

  • 1 of the patents on this record was granted since Aug 16, 2026

Patents held now

Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.

Showing 1 to 8 of 8

PatentTitleStatus Expires Confidence
US 9,939,734Photolithography Apparatus Comprising Projection System for Control of Image Size
In force
 · High confidence
In forceHigh confidence
US 10,514,609Lithographic Apparatus and Method for Preventing Peripheral Exposure of a Substrate
In force
 · High confidence
In forceHigh confidence
US 11,042,095Optical beam homogenizer based on a lens array
In force
 · From the USPTO record
In forceFrom the USPTO record
US 10,996,381Light Beam Diffuser System and Method
In force
 · High confidence
In forceHigh confidence
US 11,550,232Lithographic Systems and Methods of Operating the Same
In force
 · High confidence
In forceHigh confidence
US 11,921,435Lithographic Systems and Methods of Operating the Same
In force
 · High confidence
In forceHigh confidence
US 11,947,271Lithographic Systems and Methods of Operating the Same
In force
 · High confidence
In forceHigh confidence
US 12,717,239Methods of Patterning a Photoresist, and Related Patterning Systems
In force
 · High confidence
In forceHigh confidence

Sources and methods

Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand. How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.

Published applications

Every application published under this name has become a patent.

The Patent Finder CompaniesExpirationsCalculatorWatchlistPricing MethodologyCorrectionsLegalPrivacysupport@thepatentfinder.com Updated Nov 14, 2026 · includes USPTO assignment & status data published Nov 14, 2026 and grant & fee data published Nov 10, 2026 (weekly) Part of 137 Finder · © 2026 137 Finder LLC · Sources cited