Lotus Applied Technology, LLC
1 more in force is now held by another company
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.
Recorded under 2 name spellings.
4
Ending by 2030
Mar 2027
Next term end
When these terms end
Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045
Fee deadlines
Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
- 1 fee due Mar 15, 2027The maintenance fee for Electrically- and Chemically-Active Adlayers for Plasma Electrodes (US 9,133,546) comes due Mar 15, 2027. Unpaid by Sep 15, 2027, it lapses early.
- 1 fee due Aug 16, 2027The maintenance fee for Mixed Metal-Silicon-Oxide Barriers (US 9,263,359) comes due Aug 16, 2027. Unpaid by Feb 16, 2028, it lapses early.
- 2 fees due Sep 19 to 29, 2027 · next Sep 19
Recent changes
Nothing was recorded against this company's patents in the last 90 days.
Patents held now
Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 8,202,366 | Atomic layer deposition system utilizing multiple precursor zones for coating flexible substrates In force · From the USPTO record | In force | From the USPTO record | |
| US 9,469,901 | Atomic layer deposition method utilizing multiple precursor zones for coating flexible substrates In force · From the USPTO record | In force | From the USPTO record | |
| US 8,187,679 | Radical-enhanced atomic layer deposition system and method In force · From the USPTO record | In force | From the USPTO record | |
| US 8,137,464 | Atomic layer deposition system for coating flexible substrates In force · From the USPTO record | In force | From the USPTO record | |
| US 8,637,117 | Inhibiting excess precursor transport between separate precursor zones in an atomic layer deposition system In force · From the USPTO record | In force | From the USPTO record | |
| US 8,637,123 | Oxygen radical generation for radical-enhanced thin film deposition In force · From the USPTO record | In force | From the USPTO record | |
| US 9,297,076 | Substrate transport mechanism contacting a single side of a flexible web substrate for roll-to-roll thin film deposition In force · From the USPTO record | In force | From the USPTO record | |
| US 9,263,359 | Mixed Metal-Silicon-Oxide Barriers In force · High confidence | In force | High confidence | |
| US 9,133,546 | Electrically- and Chemically-Active Adlayers for Plasma Electrodes In force · High confidence | In force | High confidence | |
| US 9,435,028 | Plasma Generation for Thin Film Deposition on Flexible Substrates In force · High confidence | In force | High confidence |
Also on record, not counted in the 13: 1 patent in force now held by others · 1 lapsed for an unpaid fee. List them
Sources and methods
Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand.
How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.
Published applications
US patent applications published under this name that have not become patents. An application is published about eighteen months after its earliest filing; one that has not been published is in no public record.
1 pending · 1 abandoned · 4 no status recorded