Multiplanar Technologies Incorporated
Records under this name other than patents Multiplanar Technologies Incorporated holds now: patents now held by others, patents whose terms have ended, and its applications, pending or abandoned.
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| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 6,508,696 | Wafer-polishing head and polishing apparatus having the same Formerly held Term ended Term ended Aug 25, 2020 · From the USPTO record | Term ended | Term ended Aug 25, 2020 | From the USPTO record |
| US 6,966,822 | System and method for CMP having multi-pressure zone loading for improved edge and annular zone material removal control Lapsed on the fee record Ended Nov 22, 2013 · From the USPTO record | Lapsed on the fee record | Ended Nov 22, 2013 | From the USPTO record |
| US 6,893,327 | Chemical mechanical polishing apparatus and method having a retaining ring with a contoured surface Lapsed on the fee record Ended May 17, 2013 · From the USPTO record | Lapsed on the fee record | Ended May 17, 2013 | From the USPTO record |
| US 6,887,132 | Slurry distributor for chemical mechanical polishing apparatus and method of using the same Lapsed on the fee record Ended May 3, 2013 · From the USPTO record | Lapsed on the fee record | Ended May 3, 2013 | From the USPTO record |
| US 6,641,461 | Chemical mechanical polishing apparatus having edge, center and annular zone control of material removal Lapsed on the fee record Ended Nov 4, 2011 · From the USPTO record | Lapsed on the fee record | Ended Nov 4, 2011 | From the USPTO record |
| US 6,623,343 | System and method for CMP head having multi-pressure annular zone subcarrier material removal control Lapsed on the fee record Ended Sep 23, 2011 · From the USPTO record | Lapsed on the fee record | Ended Sep 23, 2011 | From the USPTO record |
| US 6,558,232 | System and method for CMP having multi-pressure zone loading for improved edge and annular zone material removal control Lapsed on the fee record Ended May 6, 2011 · From the USPTO record | Lapsed on the fee record | Ended May 6, 2011 | From the USPTO record |
| US 6,540,590 | Chemical mechanical polishing apparatus and method having a rotating retaining ring Lapsed on the fee record Ended Apr 1, 2011 · From the USPTO record | Lapsed on the fee record | Ended Apr 1, 2011 | From the USPTO record |
| US 6,527,625 | Chemical mechanical polishing apparatus and method having a soft backed polishing head Lapsed on the fee record Ended Mar 4, 2011 · From the USPTO record | Lapsed on the fee record | Ended Mar 4, 2011 | From the USPTO record |
| US 6,506,105 | System and method for pneumatic diaphragm CMP head having separate retaining ring and multi-region wafer pressure control Lapsed on the fee record Ended Jan 14, 2011 · From the USPTO record | Lapsed on the fee record | Ended Jan 14, 2011 | From the USPTO record |