The Patent Finder

Planar Semiconductor, Inc.

9 patents currently held · Updated Nov 14, 2026
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.

Recorded under 2 name spellings.

4
Ending by 2030
Jun 2027
Next term end

When these terms end

Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045

Fee deadlines

Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
  • 1 fee due May 28, 2027
    The maintenance fee for Subnanometer-level light-based substrate cleaning mechanism (US 11,830,726) comes due May 28, 2027. Unpaid by Nov 29, 2027, it lapses early.
  • 1 fee due Jun 1, 2027
    The maintenance fee for Holding and rotary driving mechanism for flat objects (US 9,202,725) comes due Jun 1, 2027. Unpaid by Dec 1, 2027, it lapses early.
  • 1 fee due Sep 1, 2027
    The maintenance fee for Single-chamber apparatus for precision cleaning and drying of flat objects (US 9,275,849) comes due Sep 1, 2027. Unpaid by Mar 1, 2028, it lapses early.

Which patents, and when each one lapses · Pro

Recent changes

Nothing was recorded against this company's patents in the last 90 days.

Patents held now

Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.

Showing 1 to 9 of 9

PatentTitleStatus Expires Confidence
US 9,799,536Apparatus and method for cleaning flat objects in a vertical orientation with pulsed liquid jet
In force
 · From the USPTO record
In forceFrom the USPTO record
US 9,418,831Method for precision cleaning and drying flat objects
In force
 · From the USPTO record
In forceFrom the USPTO record
US 9,202,725Holding and rotary driving mechanism for flat objects
In force
 · From the USPTO record
In forceFrom the USPTO record
US 9,275,849Single-chamber apparatus for precision cleaning and drying of flat objects
In force
 · From the USPTO record
In forceFrom the USPTO record
US 10,179,351Method and apparatus for cleaning flat objects with pulsed liquid jet
In force
 · High confidence
In forceHigh confidence
US 10,985,039Sub-nanometer-level substrate cleaning mechanism
In force
 · From the USPTO record
In forceFrom the USPTO record
US 11,069,521Subnanometer-level light-based substrate cleaning mechanism
In force
 · From the USPTO record
In forceFrom the USPTO record
US 10,892,172Removal of process effluents
In force
 · From the USPTO record
In forceFrom the USPTO record
US 11,830,726Subnanometer-level light-based substrate cleaning mechanism
In force
 · From the USPTO record
In forceFrom the USPTO record
Also on record, not counted in the 9: 1 lapsed for an unpaid fee. List them

Sources and methods

Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand. How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.

Published applications

Every application published under this name has become a patent.

The Patent Finder CompaniesExpirationsCalculatorWatchlistPricing MethodologyCorrectionsLegalPrivacysupport@thepatentfinder.com Updated Nov 14, 2026 · includes USPTO assignment & status data published Nov 14, 2026 and grant & fee data published Nov 10, 2026 (weekly) Part of 137 Finder · © 2026 137 Finder LLC · Sources cited