Planar Semiconductor, Inc.
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.
Recorded under 2 name spellings.
4
Ending by 2030
Jun 2027
Next term end
When these terms end
Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045
Fee deadlines
Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
- 1 fee due May 28, 2027The maintenance fee for Subnanometer-level light-based substrate cleaning mechanism (US 11,830,726) comes due May 28, 2027. Unpaid by Nov 29, 2027, it lapses early.
- 1 fee due Jun 1, 2027The maintenance fee for Holding and rotary driving mechanism for flat objects (US 9,202,725) comes due Jun 1, 2027. Unpaid by Dec 1, 2027, it lapses early.
- 1 fee due Sep 1, 2027The maintenance fee for Single-chamber apparatus for precision cleaning and drying of flat objects (US 9,275,849) comes due Sep 1, 2027. Unpaid by Mar 1, 2028, it lapses early.
Recent changes
Nothing was recorded against this company's patents in the last 90 days.
Patents held now
Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.
Showing 1 to 9 of 9
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 9,799,536 | Apparatus and method for cleaning flat objects in a vertical orientation with pulsed liquid jet In force · From the USPTO record | In force | From the USPTO record | |
| US 9,418,831 | Method for precision cleaning and drying flat objects In force · From the USPTO record | In force | From the USPTO record | |
| US 9,202,725 | Holding and rotary driving mechanism for flat objects In force · From the USPTO record | In force | From the USPTO record | |
| US 9,275,849 | Single-chamber apparatus for precision cleaning and drying of flat objects In force · From the USPTO record | In force | From the USPTO record | |
| US 10,179,351 | Method and apparatus for cleaning flat objects with pulsed liquid jet In force · High confidence | In force | High confidence | |
| US 10,985,039 | Sub-nanometer-level substrate cleaning mechanism In force · From the USPTO record | In force | From the USPTO record | |
| US 11,069,521 | Subnanometer-level light-based substrate cleaning mechanism In force · From the USPTO record | In force | From the USPTO record | |
| US 10,892,172 | Removal of process effluents In force · From the USPTO record | In force | From the USPTO record | |
| US 11,830,726 | Subnanometer-level light-based substrate cleaning mechanism In force · From the USPTO record | In force | From the USPTO record |
Also on record, not counted in the 9: 1 lapsed for an unpaid fee. List them
Sources and methods
Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand.
How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.
Published applications
Every application published under this name has become a patent.