Raytech Systems LLC

Also on record

Records under this name other than patents Raytech Systems LLC holds now: patents now held by others, patents whose terms have ended, and its applications, pending or abandoned.

Showing 1 to 9 of 9 · Back to Raytech Systems LLC

Patent	Title	Status	Expires	Confidence
US 7,037,184	Polishing Pad for Use in Chemical-Mechanical Planarization of Semiconductor Wafers and Method of Making Same Formerly held Lapsed on the fee record Ended May 2, 2014 · High confidence	Lapsed on the fee record	Ended May 2, 2014	High confidence
US 7,025,668	Gradient Polishing Pad Made from Paper-Making Fibers for Use in Chemical/Mechanical Planarization of Wafers Formerly held Lapsed on the fee record Ended Apr 11, 2014 · High confidence	Lapsed on the fee record	Ended Apr 11, 2014	High confidence
US 6,979,256	Retaining Ring with Wear Pad for Use in Chemical Mechanical Planarization Formerly held Lapsed on the fee record Ended Dec 27, 2013 · Medium confidence	Lapsed on the fee record	Ended Dec 27, 2013	Medium confidence
US 6,964,601	Method for Securing a Polishing Pad to a Platen for Use in Chemical-Mechanical Polishing of Wafers Formerly held Lapsed on the fee record Ended Nov 15, 2013 · High confidence	Lapsed on the fee record	Ended Nov 15, 2013	High confidence
US 6,945,846	Polishing Pad for Use in Chemical/Mechanical Planarization of Semiconductor Wafers Having a Transparent Window for End-Point Determination and Method of Making Formerly held Lapsed on the fee record Ended Sep 20, 2013 · High confidence	Lapsed on the fee record	Ended Sep 20, 2013	High confidence
US 6,899,610	Retaining Ring with Wear Pad for Use in Chemical Mechanical Planarization Formerly held Lapsed on the fee record Ended May 31, 2013 · High confidence	Lapsed on the fee record	Ended May 31, 2013	High confidence
US 6,875,077	Polishing Pad for Use in Chemical/Mechanical Planarization of Semiconductor Wafers Having a Transparent Window for End-Point Determination and Method of Making Formerly held Lapsed on the fee record Ended Apr 5, 2013 · High confidence	Lapsed on the fee record	Ended Apr 5, 2013	High confidence
US 6,863,774	Polishing Pad for Use in Chemical - Mechanical Palanarization of Semiconductor Wafers and Method of Making Same Lapsed on the fee record Ended Mar 8, 2013 · High confidence	Lapsed on the fee record	Ended Mar 8, 2013	High confidence
US 6,852,020	Polishing Pad for Use in Chemical - Mechanical Planarization of Semiconductor Wafers and Method of Making Same Formerly held Lapsed on the fee record Ended Feb 8, 2013 · High confidence	Lapsed on the fee record	Ended Feb 8, 2013	High confidence