SK Materials Performance Co., Ltd.
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.
7
Ending by 2030
Sep 2028
Next term end
When these terms end
Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045
Fee deadlines
Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
- 1 fee due Dec 23, 2026The maintenance fee for Additive for resist and resist composition comprising same (US 9,063,411) comes due Dec 23, 2026. Unpaid by Jun 23, 2027, it lapses early.
- 1 fee due Oct 26, 2027The maintenance fee for Additive for resist and resist composition comprising same (US 9,321,875) comes due Oct 26, 2027. Unpaid by Apr 26, 2028, it lapses early.
Recent changes
Nothing was recorded against this company's patents in the last 90 days.
Patents held now
Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 7,939,245 | Light absorbent and organic antireflection coating composition containing the same In force · From the USPTO record | In force | From the USPTO record | |
| US 8,021,826 | Copolymer and composition for organic and antireflective layer In force · From the USPTO record | In force | From the USPTO record | |
| US 8,357,482 | Organic anti-reflective layer composition containing ring-opened phthalic anhydride and method for preparation thereof In force · From the USPTO record | In force | From the USPTO record | |
| US 8,283,102 | Photoacid generator, copolymer, chemically amplified resist composition, and method of forming pattern using the chemically amplified resist composition In force · From the USPTO record | In force | From the USPTO record | |
| US 8,026,390 | Photoacid generator containing aromatic ring In force · From the USPTO record | In force | From the USPTO record | |
| US 8,158,327 | Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition In force · From the USPTO record | In force | From the USPTO record | |
| US 8,241,831 | Acid generating agent for chemically amplified resist compositions In force · From the USPTO record | In force | From the USPTO record | |
| US 8,617,789 | Photoacid generator, method for producing the same, and resist composition comprising the same In force · From the USPTO record | In force | From the USPTO record | |
| US 8,865,919 | Sulfonium compound, photo-acid generator, and method for manufacturing the same In force · From the USPTO record | In force | From the USPTO record | |
| US 8,822,617 | Copolymer for organic antireflective film, monomer, and composition comprising the copolymer In force · From the USPTO record | In force | From the USPTO record |
Also on record, not counted in the 18: 7 ended at full term. List them
Sources and methods
Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand.
How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.