SK Siltron CSS, LLC
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.
3
Ending by 2030
Feb 2028
Next term end
When these terms end
Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045
Fee deadlines
Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
- 1 fee due Jan 9, 2027The maintenance fee for Furnace for Seeded Sublimation of Wide Band Gap Crystals (US 10,344,396) comes due Jan 9, 2027. Unpaid by Jul 9, 2027, it lapses early.
- 2 fees due Apr 8 to 20, 2027 · next Apr 8
- 1 fee due Sep 8, 2027The maintenance fee for Method for Manufacturing Sic Wafer Fit for Integration with Power Device Manufacturing Technology (US 9,279,192) comes due Sep 8, 2027. Unpaid by Mar 8, 2028, it lapses early.
- 1 fee due Nov 10, 2027The maintenance fee for High Voltage Power Semiconductor Device on Sic (US 9,337,277) comes due Nov 10, 2027. Unpaid by May 10, 2028, it lapses early.
Recent changes
Nothing was recorded against this company's patents in the last 90 days.
Patents held now
Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 9,337,027 | Method of Manufacturing Substrates Having Improved Carrier Lifetimes In force · Medium confidence | In force | Medium confidence | |
| US 8,343,854 | Method of Reducing Memory Effects in Semiconductor Epitaxy In force · High confidence | In force | High confidence | |
| US 8,765,091 | Method to Manufacture Large Uniform Ingots of Silicon Carbide by Sublimation/Condensation Processes In force · High confidence | In force | High confidence | |
| US 9,017,804 | Method to Reduce Dislocations in Sic Crystal Growth In force · High confidence | In force | High confidence | |
| US 8,860,040 | High Voltage Power Semiconductor Devices on Sic In force · High confidence | In force | High confidence | |
| US 9,018,639 | Flat Sic Semiconductor Substrate In force · High confidence | In force | High confidence | |
| US 9,165,779 | Flat Sic Semiconductor Substrate In force · High confidence | In force | High confidence | |
| US 9,337,277 | High Voltage Power Semiconductor Device on Sic In force · High confidence | In force | High confidence | |
| US 10,106,912 | Reaction Cell for Growing Sic Crystal with Low Dislocation Density In force · High confidence | In force | High confidence | |
| US 10,435,810 | Graphite Crucible for Sublimation Growth of Sic Crystal In force · High confidence | In force | High confidence |
Sources and methods
Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand.
How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.
Published applications
Every application published under this name has become a patent.