Wonik IPS Co., Ltd.
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.
7
Ending by 2030
Mar 2027
Next term end
When these terms end
Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045
Fee deadlines
Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
- 1 fee due Feb 13, 2027The maintenance fee for Method of depositing a thin film (US 10,381,217) comes due Feb 13, 2027. Unpaid by Aug 13, 2027, it lapses early.
- 2 fees due Mar 17 to 26, 2027 · next Mar 17
- 1 fee due Apr 10, 2027The maintenance fee for Method and apparatus for atomic layer etching (US 11,784,029) comes due Apr 10, 2027. Unpaid by Oct 12, 2027, it lapses early.
- 1 fee due May 21, 2027The maintenance fee for Processing method for substrate (US 11,823,907) comes due May 21, 2027. Unpaid by Nov 22, 2027, it lapses early.
- 1 fee due Jul 16, 2027The maintenance fee for Substrate processing method (US 11,875,998) comes due Jul 16, 2027. Unpaid by Jan 18, 2028, it lapses early.
- 1 fee due Aug 23, 2027The maintenance fee for Method of manufacturing semiconductor device using the same (US 9,269,568) comes due Aug 23, 2027. Unpaid by Feb 23, 2028, it lapses early.
- 2 fees due Oct 23, 2027
Recent changes
Nothing was recorded against this company's patents in the last 90 days.
Patents held now
Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 7,439,116 | Apparatus and method for forming polycrystalline silicon thin film In force · From the USPTO record | In force | From the USPTO record | |
| US 7,525,068 | Heating system of batch type reaction chamber and method thereof In force · From the USPTO record | In force | From the USPTO record | |
| US 8,980,742 | Method of Manufacturing Multi-Level Metal Thin Film and Apparatus for Manufacturing the Same In force · High confidence | In force | High confidence | |
| US 7,963,735 | Holder manufacturing method for loading substrate of semiconductor manufacturing device, batch type boat having holder, loading/unloading method of semiconductor substrate using the same, and semiconductor manufacturing device having the same In force · From the USPTO record | In force | From the USPTO record | |
| US 8,741,096 | Apparatus for semiconductor processing In force · From the USPTO record | In force | From the USPTO record | |
| US 9,269,568 | Method of manufacturing semiconductor device using the same In force · From the USPTO record | In force | From the USPTO record | |
| US 8,367,549 | Method of manufacturing semiconductor device In force · From the USPTO record | In force | From the USPTO record | |
| US 9,506,146 | Thin film vapor deposition method and thin film vapor deposition apparatus In force · From the USPTO record | In force | From the USPTO record | |
| US 8,673,676 | Surface processing method of silicon substrate for solar cell, and manufacturing method of solar cell In force · From the USPTO record | In force | From the USPTO record | |
| US 9,793,476 | Apparatus and method for treating a substrate In force · From the USPTO record | In force | From the USPTO record |
Also on record, not counted in the 46: 10 lapsed for an unpaid fee · 11 ended at full term. List them
Sources and methods
Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand.
How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.
Published applications
US patent applications published under this name that have not become patents. An application is published about eighteen months after its earliest filing; one that has not been published is in no public record.
9 pending · 2 abandoned · 19 no status recorded