Ycchem Co., Ltd.
Held is read from USPTO's recorded assignments; a transfer never recorded there does not appear.
0
Ending by 2030
Jan 2034
Next term end
When these terms end
Held patents by the year their term ends
20262027202820292030203120322033203420352036203720382039204020412042204320442045
Fee deadlines
Maintenance fees fall due 3.5, 7.5 and 11.5 years after grant. A missed fee ends a patent at the end of the six month grace period that follows, not on the due date.
- 2 fees due Jul 7 to 21, 2027 · next Jul 7
Recent changes
- 2 of the patents on this record were granted since Aug 16, 2026
- 1 term has ended since Aug 16, 2026
Patents held now
Soonest term end first. Each date below is computed on that patent's own page, which shows the rule, the adjustments and the fee history it was derived from.
| Patent | Title | Status | Expires | Confidence |
|---|---|---|---|---|
| US 9,884,970 | Coating composition for preventing collapse of capacitor In force · From the USPTO record | In force | From the USPTO record | |
| US 9,829,797 | Cleaning composition for photolithography and method of forming photoresist pattern using the same In force · From the USPTO record | In force | From the USPTO record | |
| US 10,162,261 | Negative photoresist composition for KrF laser for forming semiconductor patterns In force · From the USPTO record | In force | From the USPTO record | |
| US 10,539,871 | I-line negative type photoresist composition having excellent etching resistance In force · From the USPTO record | In force | From the USPTO record | |
| US 10,526,508 | Slurry composition for CMP and polishing method using same In force · From the USPTO record | In force | From the USPTO record | |
| US 10,717,878 | Anti-reflection coating composition and anti-reflection film utilizing same In force · From the USPTO record | In force | From the USPTO record | |
| US 11,586,109 | Chemically-amplified-type negative-type photoresist composition In force · From the USPTO record | In force | From the USPTO record | |
| US 11,169,444 | Method and composition for improving LWR in patterning step using negative tone photoresist In force · From the USPTO record | In force | From the USPTO record | |
| US 11,187,985 | Method and composition for improving LWR in patterning step using negative tone photoresist In force · From the USPTO record | In force | From the USPTO record | |
| US 10,775,699 | Negative photoresist composition for KRF laser, having high resolution and high aspect ratio In force · From the USPTO record | In force | From the USPTO record |
Also on record, not counted in the 36: 1 ended at full term. List them
Sources and methods
Compiled from the USPTO record, grants, published applications and recorded assignments, not yet reviewed by hand.
How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.
Published applications
US patent applications published under this name that have not become patents. An application is published about eighteen months after its earliest filing; one that has not been published is in no public record.
5 pending · 1 no status recorded