Nano-scale/nanostructured Si coating on valve metal substrate for LIB anodes
US 10,230,110 Surrendered on reissueSurrendered on reissue Feb 14, 2023 · From the USPTO record
20-year base term ends Sep 1, 2037
Surrendered on reissue Feb 14, 2023 · its term and maintenance fees continue in US RE49,419.
Sep 1, 2017
Feb 14, 2023
Mar 12, 2019
Sep 1, 2037
How we calculated this date
| Step | Input | Date after this step | Confidence |
|---|---|---|---|
| Base term, 20 years from filing | Clock starts Sep 1, 2017, when this application, 15/694,575, was filed | Sep 1, 2037 | High confidence |
| Continuity chain | Every parent in the chain resolved | no change | High confidence |
| Patent term adjustment | No term adjustment record on a grant after 2005, so none is added | no change | Medium confidence |
| Terminal disclaimer cap | None on record | no cap applied | High confidence |
| Patent term extension | None on file | no change | High confidence |
| Fee events | 1 of 3 maintenance fees paid | no change | High confidence |
| Reissue | US RE49,419 issued Feb 14, 2023, and this patent's term continues in it (35 U.S.C. 251, 252) | surrendered Feb 14, 2023 | High confidence |
| Surrendered on reissue | The steps above, in order | Feb 14, 2023 | From the USPTO record |
Sources
Google Patents · The patent document at USPTO · Assignment records at USPTO
USPTO account required: This application in Patent Center · USPTO's maintenance fee lookup
Maintenance fee events come from USPTO's own fee records. Its fee lookup asks for the patent number and the application number.
Not on this page: the patent's family, its recorded assignments and its citation count. USPTO's assignment records, linked above, list every recorded assignment.
Every date shows its work: the base term, any term adjustment or extension, any disclaimer cap, and the maintenance fee record, each with a confidence tier. How this record was built
Computed patent terms end on the dates shown. Related patents and pending applications may cover overlapping subject matter.